发明名称 Apparatus for the preparation of a functional deposited film by means of photochemical vapor deposition process
摘要 An improvement in the photochemical vapor deposition apparatus for the preparation of a functional deposited film on a substrate by exciting and decomposing, or polymerizing a raw material as by way of a photochemical reaction, which comprises a reaction chamber with a raw material gas introducing means and an exhaust means, a radiant light transmissive window and a means to supply a light energy through the light transmissive window to the raw material gas introduced into the reaction space of the reaction chamber. The improvement comprises providing the above apparatus with a means to irradiate an infrared energy ray containing a wavelength having a vibrational absorption power for the raw material gas molecule concurrently with the irradiation of light energy. The improved photochemical vapor deposition apparatus enables one to stably and repeatedly prepare a desired functional deposited film of high quality and having a wealth of practically applicable characeristics at an improved film deposition rate without foreign matter resulting from the raw material gas being deposited on the inner face of the light transmissive window.
申请公布号 US5112647(A) 申请公布日期 1992.05.12
申请号 US19900481690 申请日期 1990.02.20
申请人 CANON KABUSHIKI KAISHA 发明人 TAKABAYASHI, AKIHARU
分类号 C23C16/24;B05D3/06;B05D7/24;C09D4/00;C23C16/30;C23C16/48;G03F7/20;H01L21/205;H01L21/263 主分类号 C23C16/24
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