| 摘要 |
PURPOSE:To control the temperature rise of an X-ray penetrable film for transferring fine patterns with accuracy and stability by forming a space between a supporting frame which has the X-ray penetrable film with absorber patterns formed on its surface and a reinforcing frame which is brought into contact with the rear surface of the supporting frame. CONSTITUTION:A reinforcing frame 5 of an X-ray mask 'A' is gripped by a loading apparatus and is held by a mask stage 10 with its rear surface stuck by vacuum suction of the mask stage 10. A resist-applied wafer 11 is so held on a wafer stage 12 that it may face the mask 'A'. With an alignment optical system 15, the wafer 11 is adjusted to the mask 'A'. After that, the X-ray 14 which is conducted by a beam line 13 is cast on the mask 'A' and wafer 11. At that time, He gas, a cooling gas, is supplied through a supply tube 17 into a space 8 formed between a mask 'A' supporting frame 1 and reinforcing frame 5 (in the direction shown by an arrow 'G') to cool an X-ray penetrable film 2. The X-ray is cast on the wafer 11 through the mask 'A' to expose the resist applied onto the wafer 11 to the X-ray for exposure of the wafer. |
