Magnetron sputter source,申请号DE19914127260-传众专利搜索

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发明名称	Magnetron sputter source
摘要	Magnetron sputter source has a base plate (1) of non-magnetic material, attached via seals (3) to the vessel wall (2) and mounting an electrically insulated cooling plate (4), with the target attached to it. The target (5) is surrounded by an anode (6), with which it forms a plane. On the atmos. side, under the base plate is the magnet system (7), the distance from the base plate being variable. Cooling water is circulated via insulated connections (9), which also supply voltage to the target.
申请公布号	DE4127260(C1)	申请公布日期	1992.04.16
申请号	DE19914127260	申请日期	1991.08.17
申请人	FORSCHUNGSGESELLSCHAFT FUER ELEKTRONENSTRAHL- UND PLASMATECHNIK MBH, O-8051 DRESDEN, DE	发明人	HOLFELD, ANDREAS, DR.-ING., O-8027 DRESDEN, DE
分类号	C23C14/34;H01J37/34	主分类号	C23C14/34
代理机构		代理人
主权项
地址

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