发明名称 SUBSTRATE TRANSFER METHOD
摘要 PURPOSE:To restrain an irregularity in control parameters by a method wherein the waiting time of a transfer means is set just before a single heat-treatment part or a plurality of heat treatment parts, the tact time at a cyclic movement is set, the tact time is set as the sum total or higher of the waiting time during which the transfer means makes a tour and the one-tour movement time and the tact time is set at the treatment time or higher at each heat treatment time including the waiting time at the heat treatment part. CONSTITUTION:The movement cycle at a cyclic movement is set in such a way that it is not changed at the transition period or the like of a lot. The start time of an HP1 treatment is delayed by t3 in such a way that the HP1 treatment is finished at the time when a robot is returned to a treatment part 41. Concretely, before a wafer to be subjected to the HP1 treatment from now is fed to the treatment part 41, the robot is on standby for t3 just before the treatment part 41.
申请公布号 JPH04113612(A) 申请公布日期 1992.04.15
申请号 JP19900234095 申请日期 1990.09.03
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 NISHIDA MASAMI;HIMOTO MASAHIRO;HAMADA TETSUYA;YOKONO KENSHO;OKAMOTO TAKEO
分类号 H01L21/00;H01L21/02;H01L21/027;H01L21/30;H01L21/677 主分类号 H01L21/00
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