发明名称 |
SUBSTRATE TRANSFER METHOD |
摘要 |
PURPOSE:To restrain an irregularity in control parameters by a method wherein the waiting time of a transfer means is set just before a single heat-treatment part or a plurality of heat treatment parts, the tact time at a cyclic movement is set, the tact time is set as the sum total or higher of the waiting time during which the transfer means makes a tour and the one-tour movement time and the tact time is set at the treatment time or higher at each heat treatment time including the waiting time at the heat treatment part. CONSTITUTION:The movement cycle at a cyclic movement is set in such a way that it is not changed at the transition period or the like of a lot. The start time of an HP1 treatment is delayed by t3 in such a way that the HP1 treatment is finished at the time when a robot is returned to a treatment part 41. Concretely, before a wafer to be subjected to the HP1 treatment from now is fed to the treatment part 41, the robot is on standby for t3 just before the treatment part 41. |
申请公布号 |
JPH04113612(A) |
申请公布日期 |
1992.04.15 |
申请号 |
JP19900234095 |
申请日期 |
1990.09.03 |
申请人 |
DAINIPPON SCREEN MFG CO LTD |
发明人 |
NISHIDA MASAMI;HIMOTO MASAHIRO;HAMADA TETSUYA;YOKONO KENSHO;OKAMOTO TAKEO |
分类号 |
H01L21/00;H01L21/02;H01L21/027;H01L21/30;H01L21/677 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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