发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE INSULATING SUBSTRATE AND METAL PATTERN PLATE THEREFOR
摘要 PURPOSE:To manufacture an insulating substrate including a thick circuit pattern inexpensively with higher dimensional accuracy by preparing a metal pattern plate including in integration a body part formed to be relatively thicker and a connection part formed to be relatively thinner, and fixing the metal pattern plate onto an insulating film and removing the connection part. CONSTITUTION:An insulating film 2 is formed by applying epoxy resin on the entire upper surface of a metal flat plate 1. Prior to curing of the epoxy resin a metal pattern plate 10 is positioned and placed on the insulating film 2. A resist layer 3 is formed by patterning a resist on the entire upper surface of the same. Connection parts 12, 13 are etched and removed with the resist layer 3 taking as a mask, and thereafter the resist layer 3 is removed to yield a circuit pattern P including only body parts 11a-11c.
申请公布号 JPH0496258(A) 申请公布日期 1992.03.27
申请号 JP19900207271 申请日期 1990.08.03
申请人 MITSUBISHI ELECTRIC CORP 发明人 TAKAHAMA SHINOBU;KAMISHIMA KUNITAKA
分类号 H05K3/44;H01L21/48;H01L23/12;H01L23/14;H01L23/48;H01L23/495;H05K3/02 主分类号 H05K3/44
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