发明名称 PATTERN INSPECTING METHOD
摘要 PURPOSE:To detect minute defects and transparent flaws existing together with the patterns being examined irrespective of the sizes of the patterns being examined by detecting the characteristics of the diffracted light from the patterns being examined by the use of the photo detectors which are arrayed at different space frequencies with respect to the optical axis.
申请公布号 JPS545750(A) 申请公布日期 1979.01.17
申请号 JP19770070857 申请日期 1977.06.15
申请人 FUJITSU LTD 发明人 NAKASHIMA MASAHITO;FUJIWARA KATSUMI;GOTOU YOSHIAKI
分类号 G01M3/38;G01B11/24;G01N21/88;G01N21/956;G02B27/46;G03F1/84;H01L21/027;H01L21/66 主分类号 G01M3/38
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