发明名称 |
PATTERN INSPECTING METHOD |
摘要 |
PURPOSE:To detect minute defects and transparent flaws existing together with the patterns being examined irrespective of the sizes of the patterns being examined by detecting the characteristics of the diffracted light from the patterns being examined by the use of the photo detectors which are arrayed at different space frequencies with respect to the optical axis. |
申请公布号 |
JPS545750(A) |
申请公布日期 |
1979.01.17 |
申请号 |
JP19770070857 |
申请日期 |
1977.06.15 |
申请人 |
FUJITSU LTD |
发明人 |
NAKASHIMA MASAHITO;FUJIWARA KATSUMI;GOTOU YOSHIAKI |
分类号 |
G01M3/38;G01B11/24;G01N21/88;G01N21/956;G02B27/46;G03F1/84;H01L21/027;H01L21/66 |
主分类号 |
G01M3/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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