发明名称 Method and apparatus for analysis of gases using plasma.
摘要 <p>In the analysis of a specimen gas for at least one impurity, the specimen is fed to a microwave-induced plasma (100) and the plasma is analyzed for the impurity. The plasma is formed by gases fed to it via an inner tube (34) and an outer tube (2) around said inner tube (34). The specimen is fed in undiluted form via the inner tube (34) and a second gas which may be a standard gas is fed via the outer tube (2). The specimen gas and the second gas have compositions which are the same as to at least 75% by volume, e.g. are both air. A variety of analysis processes is made available.</p>
申请公布号 EP0475636(A2) 申请公布日期 1992.03.18
申请号 EP19910307887 申请日期 1991.08.28
申请人 HITACHI, LTD. 发明人 KOGA, MASATAKA;KAWACHI, KATUO;YAMASHITA, HIROMI;OKAMOTO, YUKIO;OKUMOTO, TOYOHARU
分类号 G01N27/68;G01N21/73;H01J49/04 主分类号 G01N27/68
代理机构 代理人
主权项
地址