发明名称 Method and apparatus for displaying process end point signal based on emission concentration within a processing chamber
摘要 A method facilitates the display of a filtered signal which represents the variation of light intensity in a processing chamber over time. The filtered signal filters out the effects of a magnetic field which causes plasma within the processing chamber to rotate. The magnetic field is generated by a signal with a period T. Light intensity within the process chamber is detected to produce a voltage signal with a voltage amplitude which varies based on the light intensity within the process chamber. The voltage amplitude of the voltage signal is digitally sampled at a sampling interval to obtain sample values. Running averages of a preselected number of sample values are calculated. The period T is set equal to the preselected number of sample values times the sampling interval times an integer. For each newly displayed running average, a rectangular box may be superimposed over a graph of the running averages in order to graphically display changes in slope. The computer is programmed to look for an anticipated sequence of slopes.
申请公布号 US5097430(A) 申请公布日期 1992.03.17
申请号 US19900464836 申请日期 1990.01.16
申请人 APPLIED MATERIALS, INC. 发明人 BIRANG, MANOOCHER
分类号 G06F17/00;H01J37/32 主分类号 G06F17/00
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