发明名称 PLASMA CVD DEVICE
摘要 PURPOSE:To enable accurate rotation by bringing a substrate holder into circular linear contact with a rotating shaft in a device for forming a deposited film on a cylindrical substrate under rotation. CONSTITUTION:A cylindrical substrate 102a is fitted to a substrate holder 101a and this holder 101a is brought into contact with a rotating shaft 103a for holding and rotating the substrate 102a and the holder 101a at a position above the center of gravity of the holder 101a. The top 104a of the shaft 103a is made spherical, the bearing hole 105a in the holder 101a is made conical and they are brought into circular linear contact with each other so that the substrate 102a and the holder 101a can make an angle to the shaft 103a. By this rotating mechanism, the substrate 102a and the holder 101a can be rotated while keeping the perpendicular state.
申请公布号 JPH0480370(A) 申请公布日期 1992.03.13
申请号 JP19900194001 申请日期 1990.07.24
申请人 CANON INC 发明人 HASHIZUME JUNICHIRO
分类号 C23C16/50;H01L21/205;H01L21/31;H01L31/04 主分类号 C23C16/50
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