METHOD AND APPARATUS FOR CLEANING SEMICONDUCTOR SUBSTRATE,申请号JP19900188065-传众专利搜索

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发明名称	METHOD AND APPARATUS FOR CLEANING SEMICONDUCTOR SUBSTRATE
摘要
申请公布号	JPH0475341(A)	申请公布日期	1992.03.10
申请号	JP19900188065	申请日期	1990.07.18
申请人	FUJITSU LTD;FUJITSU VLSI LTD;FUJITSUU TOUHOKU EREKUTORONIKUSU:KK	发明人	KOBAYASHI MASANORI;NAKAJIMA KAZUJI;YOSHIKAWA TADAYOSHI
分类号	B08B3/10;H01L21/304	主分类号	B08B3/10
代理机构		代理人
主权项
地址

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