| 摘要 |
PURPOSE:To form a high throughput type electron beam lithography equipment by selecting the surface of a buffer memory storing data to be written next during the time when written data are each transferred and stored to one surface of corresponding buffer memories from an external auxiliary memory and reading and writing the written data. CONSTITUTION:An exposure control section 7 reads and write the data of a field 1 from memory A. When receiving the completion of writing, processing, such as the movement of a stage to the next field 2, the measurement of height, etc., is executed, and a changeover section 63 for a buffer memory 6 is changed over to a memory C, and writing is stared. The exposure control section 7 reads and write the data of the field 2 from the memory C. Data transfer and writing operation are repeated by the end of both the processing of movement to the next field 3 and the measurement of height after the completion of writing and said data transfer, and writing after the field 3 is executed.
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