| 摘要 |
PURPOSE:To irradiate a resist film of the parts exclusive of heated parts with an in beam and to selectively and easily remove only these parts by subjecting only the parts to be left as a mask of the resist film to a heat treatment to lower sensitivity. CONSTITUTION:A resist material essentially consisting of nitrocellulose is applied on a substrate 1 to form the resist film 2. The parts to be irradiated with the ion beam have the relatively high sensitivity if the parts to be left as the mask of the resist film 2 are selectively heated. Exposing and developing are simultaneously executed and drawn patterns are successively formed when the non-heated parts are thereafter successively irradiated with the ion beam. Apertures 3 are formed in desired patterns on the resist film 2 in this way. The drawn patterns which are less disturbed in shape are formed without applying the damages by the ion beam to a substrate, etc., which are the substrate for the nitrocellulose resist. Since the nitrocellulose of the parts to be removed is maintained at the high sensitivity, there is no need for using a powerful ion beam irradiating device. |
