| 摘要 |
PURPOSE:To accurately measure a distortion difference when another wavelength is used by separating TTR alignment by means of another wavelength and exposing light systems and simultaneously detecting a reference mark group arranged on the image forming surface of a projection optical system. CONSTITUTION:When a reference plate FP is positioned so that a mark RMr and reference mark FMr can be detected simultaneously with a TTR alignment system AO1, a mark Au and reference mark Fu are simultaneously detected with another TTR alignment system AO2x. Since the relations between the reference marks FMr and Fu on the plate FP and between the marks RMr and Au on a reticule R are accurately known in advance, the difference between alignment errors detected by the another wavelength and exposing wavelength systems AO2x and AO1 can be used for the correction of alignment of the reticule R and wafers after the difference is stored in the form of offset quantities caused by the chromatic aberration at the position of the mark Au. |
