| 摘要 |
A wafer wet processing device which comprises a processing container containing side walls; means for introducing a processing solution to the lower portion of said container; means for removing the processing solution from the upper portion of said container; and a wafer carrier containing side walls and being open at the top and bottom thereof, said wafer carrier being slidably disposed within said processing chamber, wherein at least the lower portion of the side walls of said processing container is contiguous with the lower portion of the side walls of said wafer carrier so that the entirety of the processing solution is introduced within the wafer carrier.
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