发明名称 |
SHIELDING FOR ARC SUPPRESSION IN ROTATING MAGNETRON SPUTTERING SYSTEMS |
摘要 |
A cathode body (12) for a rotating cylindrical magnetron (10) wherein the magnetron provides a sputtering zone extending along the length of the cathode body (12) and circumferentially along a relatively narrow region thereof. The cathode body (12) includes an elongated tubular member (14) having a target material (16) at t he outer surface thereof. A collar (32) of electrically- conductive material is located at at least one end of the tubular member (14 ), and extends along the tubular member (14) from that one end into the erosion zone. A sleeve of electrically-conductive material may extend circumferentially around the collar (32).
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申请公布号 |
CA2089149(A1) |
申请公布日期 |
1992.02.11 |
申请号 |
CA19912089149 |
申请日期 |
1991.07.31 |
申请人 |
VIRATEC THIN FILMS INC |
发明人 |
DICKEY ERIC R;BJORNARD ERIK J |
分类号 |
C23C14/34;C23C14/35;H01J37/34;(IPC1-7):C23C14/35 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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