| 摘要 |
A substrate retaining apparatus suitable for various kinds of manufacturing apparatuses used in a photolithographic step for manufacturing microdevices, for example, semiconductor elements, liquid crystal display elements, imaging elements (CCD) and film magnetic heads; and an exposure apparatus for manufacturing such microdevices, the substrate retaining apparatus using a ceramic material of a low thermal expansibility as a base material, which is coated with a material the hardness of which is higher than that of the base material after the base material has been surface finished to a predetermined shape, the exposure apparatus having a substrate table, a substrate holder and a reference mark-carrying reference member which are formed of materials of a low thermal expansibility having a substantially equal thermal expansion coefficient.
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