发明名称 ON-AXIS AIR GAGE FOCUS SYSTEM
摘要 A lithography tool having an improved focus system. The focus system comprises a lens mounted in a nosepiece which defines a chamber. The chamber defines an onifice through which the lens system may see a workpiece. An air supply is provided to supply a regulated and measured air flow to the chamber. By measuring the air flow into the chamber, the rate of air flow through the orifice may be determined. The rate of air flow through the orifice is proportional to the gap between the orifice and a workpiece.
申请公布号 US5087927(A) 申请公布日期 1992.02.11
申请号 US19900472894 申请日期 1990.01.31
申请人 ATEO CORPORATION 发明人 THOMAS, TIM;CHRISTENSON, ERIC;HOLSTROM, BOB;MINO, JR., EUGENE
分类号 G01B13/00;G01B13/02;G02B7/28;G03F7/20;G03F7/207;G03F9/00 主分类号 G01B13/00
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