发明名称 RESIST PATTERN FORMING METHOD
摘要 <p>PURPOSE:To enable a pattern to be directly formed from digital signals by using a transparent heat sensitive recording material capable of forming a color image by heating a photomask film. CONSTITUTION:The transparent heat sensitive recording material to be used has a color image formed on the photomask film by heating, and is provided on a transparent support with a transparent heat sensitive layer capable of developing color by heating, and as the color developing material, a combination of an electron donative dye precursor and a color developing agent or a that of diazo compound and a coupler is used. As the electron donative dye precursor, a colorless or pale-colored compound is properly selected from compounds giving electrons and receiving a proton, such as acid, and developing color, and are embodies by derivatives of triarylmethane, diphenylmethane, and xanthene, thus permitting a pattern to be directly formed by using digital signals.</p>
申请公布号 JPH0440454(A) 申请公布日期 1992.02.10
申请号 JP19900147637 申请日期 1990.06.06
申请人 FUJI PHOTO FILM CO LTD 发明人 HOSOI NORIYUKI
分类号 G03F1/54;G03F1/68;H05K3/00 主分类号 G03F1/54
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