| 摘要 |
PURPOSE:To prevent exposure of an element area on the texture of wafer by using a reticle cover which has projecting parts, which correspond to the extent of movement of a masking blade, in the right and the left of a mark forming pattern for position detection. CONSTITUTION:An element forming pattern 2 is formed in the center on a reticle formed by coating a glass substrate with a chromium film, and a scribe line forming pattern 4 is formed around the element forming pattern 2. A reticle cover 7 is formed around the pattern 4, and mark forming patterns 8a and 8b for position detection are formed on the outside of the cover 7. This cover 7 is provided with projecting parts, which correspond to the extent of movement of blades 10a and 10b, in the right and the left of mark forming patterns 8a and 8b in the movement directions of masking blades 10a and 10b. Thus, unnecessary exposure of the element area on the texture of the wafer is prevented when the blade 10a or 10b is moved to simultaneously expose the mark forming patterns 8a and 8b and the element forming pattern 2. |
