Method of forming an electrode on a mask for manufacturing semiconductor devices, spinner for applying resist to a semiconductor-manufacturing mask, and mask-housing case.

摘要

In a method of forming an electrode on a mask for manufacturing semiconductor devices according to this invention, part of the surface of the conducting film (12) is masked with masking material (32) and then resist is applied to it. Because the masked part has not been coated with the resist, the conducting film is exposed there. The exposed conducting film is used as an electrode.