| 摘要 |
<p>In a projection exposure device in which an exposure light from a light source device is transmitted through a mask having a predetermined pattern formed therein and then an image of a mask pattern is focused by a projection lens on an exposure member held by a holding mechanism, an exposure light is emitted from the light source device along a horizontal optical axis. The mask, the projection lens and the exposure member are disposed on the horizontal optical axis and the holding mechanism is formed such that the exposure member is movable at least within a plane perpendicular to the horizontal optical axis. The distortion of the exposure member can be prevented to enable exposure at high accuracy and, also, with high throughput by holding the exposure member vertically, mask alignment is facilitated, the effect of heat from the light source can be minimized, and the size and the cost of the device can be reduced.</p> |
