发明名称 OFF-CENTER GATE CUT
摘要 A semiconductor device includes a diffusion area, a gate structure coupled to the diffusion area, and a dummy gate structure coupled to the diffusion area. The gate structure extends a first distance beyond the diffusion area, and the dummy gate structure extends a second distance beyond the diffusion area.
申请公布号 WO2016122882(A1) 申请公布日期 2016.08.04
申请号 WO2016US13214 申请日期 2016.01.13
申请人 QUALCOMM INCORPORATED 发明人 LIU, YANXIANG;SONG, STANLEY, SEUNGCHUL
分类号 H01L27/02;H01L27/092 主分类号 H01L27/02
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