| 摘要 |
PURPOSE:To discriminate dust particles adhering to an X-ray absorbing pattern from the pattern, to remove the dust particle and to solve a problem that an X-ray exposure mask cannot be used by a method wherein the X-ray absorbing pattern is formed on the surface of a thin film and its surface is covered with a protective film. CONSTITUTION:At an X-ray exposure mask 11, for proximity exposure use, in which the rear surface (the surface) of a thin film 2 is faced with a substrate to be transcribed, an X-ray absorbing pattern 3 is formed on the rear surface of the thin film 2 which transmits X-rays, and a ring-shaped frame body 13 on which a protective film 12 transmitting the X-rays has been spread and installed is bonded to the rear surface of the film 2. Since the pattern 3 and its formation face are covered with the film 12, a dust particle 7 in the air does not adhere to the pattern 3, adheres to the surface of the film 2 or to the rear surface of the film 12, and can be discriminated from the pattern 3 and detected in the thickness direction of the mask 11 by making use of an optical apparatus. The dust particle can be blown off by using an inexpensive blower; it is possible to solve problems that a defective pattern is transmitted and that the mask 11 cannot be used when the dust particle adhering to the pattern cannot be removed. |
