MANUFACTURE OF SEMICONDUCTOR FINE PARTICLES-DOPED SILICA GLASS,申请号JP19900099531-传众专利搜索

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发明名称	MANUFACTURE OF SEMICONDUCTOR FINE PARTICLES-DOPED SILICA GLASS
摘要
申请公布号	JPH03295826(A)	申请公布日期	1991.12.26
申请号	JP19900099531	申请日期	1990.04.16
申请人	SEIKO EPSON CORP	发明人	TAKEUCHI TETSUHIKO
分类号	C03B20/00;C03B8/02;C03B19/12	主分类号	C03B20/00
代理机构		代理人
主权项
地址

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