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发明名称
SILICON SEMICONDUCTOR LAYER FORMING METHOD
摘要
申请公布号
JPH03292719(A)
申请公布日期
1991.12.24
申请号
JP19900094613
申请日期
1990.04.10
申请人
SEIKO EPSON CORP
发明人
HASHIZUME TSUTOMU
分类号
G02F1/136;G02F1/1368;H01L21/20;H01L21/263;H01L21/336;H01L29/78;H01L29/786
主分类号
G02F1/136
代理机构
代理人
主权项
地址
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