| 摘要 |
PURPOSE:To increase the photosensitivity and to extend the development latitude by using a compound producing an acid when irradiated with active light and a specified compound having a silyl ether group decomposable with the acid and increasing the solubility in a developing soln. by the action of the acid. CONSTITUTION:A compound producing an acid when irradiated with active light and a compound having at least one silyl ether group decomposable with the acid and increasing the solubility in a developing soln. by the action of the acid are added. The silyl ether group is represented by a formulaidenticalC-O-Siidentical. The latter compound is represented by formula I or II (where R1is m-valent aliphatic or aromatic hydrocarbon which may have a substituent; each of R2, R3 and R4 is H, alkyl, alkenyl, aryl or aralkyl which may have a substituent, halogen or -OR6, preferably 1-4C alkyl, Cl or -OR6, especially preferably 1-4C alkyl or -OR6; R5 is bivalent aliphatic or aromatic hydrocarbon which may have a substituent; and R6 is alkyl or aryl which may have a substituent). The preferred former compound is o-quinone-diazidosulfonyl chloride. It is preferable that a combination of the compounds is mixed with an alkali-soluble resin and used as a photosolubilizable composition. Other additives may be added furthermore. The resulting composition has a wide development latitude, and it is used in the manufacture of a lithographic printing plate, a proof plate for printing or the like. |
