| 摘要 |
PURPOSE:To decrease the propagation loss of an optical waveguide by forming a transfer metallic mask, executing dry etching again after eliminating the mask and transferring a pattern of the mask to an optical waveguide forming film, and thereafter, eliminating the mask. CONSTITUTION:By using a transfer pattern 15a as a mask, dry etching is performed to a pattern transfer resist film 14, and thereafter, by eliminating the transfer pattern 15a, a transfer resist pattern 14a is formed. Subsequently, by using the transfer pattern 14a as a mask, dry etching is executed to a metallic film 13, and thereafter, by eliminating the transfer resist pattern 14, a transfer metallic pattern 13a is formed on an optical waveguide forming film 12. In the end, by using the transfer metallic pattern 13a as a mask, dry etching is executed to the optical waveguide forming film 12, and thereafter, by eliminating the transfer metallic pattern 13a, a pattern 12a of a target optical waveguide is formed. In such a way, the optical waveguide of a design shape is reproduced exactly. |
