Apparatus for removing contaminants from a liquid reservoir

摘要

An apparatus and method for skimming contaminants from a reservoir of a liquid such as an industrial solvent, including a tubular wand having an end inlet extending into the reservoir, a pressure air line extending along the wand, the air line protruding a side wall of the wand and terminating at a nozzle proximate the inlet, the nozzle being directed into the wand, away from the inlet for producing a vacuum. The wand is adjustably mounted to a base that attaches to the reservoir, and is connected to a vented container for collecting the contaminants that are drawn into the wand. Contaminants can be removed from the surface of the liquid, from proximate the bottom of the reservoir, or from a submerged layer concentrated at an intermediate depth within the reservoir.