发明名称 |
PRESSURIZED CONTACT TYPE DOUBLE GATE STATIC INDUCTION THYRISTOR |
摘要 |
A pressurized contact type double gate static induction thyristor comprising a semiconductor body located in a casing and having cathode electrodes and a first gate electrode at one principal surface side thereof and anode electrodes and a second gate electrode at the other principal surface side thereof. A first thermal expansion stress buffer plate is located in the casing to be in contact with the cathode electrode, and a second thermal expansion stress buffer plate is located at the other principal surface side of the semiconductor body. This second plate is composed of at least two metal members electrically insulated from each other and integrally bonded by an insulating material, one of the two metal members being in contact with the anode electrode and the other metal member being in contact with the second gate electrode. |
申请公布号 |
EP0194946(B1) |
申请公布日期 |
1991.12.04 |
申请号 |
EP19860400533 |
申请日期 |
1986.03.13 |
申请人 |
RESEARCH DEVELOPMENT CORPORATION OF JAPAN;NISHIZAWA, JUN-ICHI;MITSUBISHI ELECTRIC CORPORATION |
发明人 |
NISHIZAWA, JUN-ICHI;KONDOH, HISAO |
分类号 |
H01L29/74;H01L23/051;H01L23/48;H01L29/739 |
主分类号 |
H01L29/74 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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