| 摘要 |
PURPOSE:To minimize the defective development of a resist by a method wherein the jetting work of a gas having the window pressure component in parallel with and in the same direction as that of the liquid level of a developer held on the surface of the resist is continuously shifted from one end to the other end of the liquid level of the developer. CONSTITUTION:The title development process is performed by continuously shifting the jetting work of a gas 13 having the wind pressure component in parallel with and in the same direction as that of the liquid level of a developer 12 held on the surface of a resist 11 from one end to the other end of the liquid level of the developer 12. Accordingly, even if a bubble 14 comprising air is formed in the developer 12 held on the surface of the resist 11, the bubble 14 is shifted together with the shifting of the jetting work finally to be discharged out of the developer 12. Through these procedures, the developer 12 in perfectly wet state is held on the surface of the resist 11 thereby enabling the defective development of the resist 11 to be avoided. |
