发明名称 METHOD OF PRODUCING HIGH SURFACE AREA LOW METAL IMPURITY TANTALUM POWDER
摘要 <p>A process for producing a high purity tantalum powder wherein a small quantity of an active ingredient, having a higher thermodynamic potential and chemical activity than the metal surfaces of the reactor vessel, is added to the reactor before the reactor is heated to reaction temperatures.</p>
申请公布号 WO1991018121(A1) 申请公布日期 1991.11.28
申请号 US1991003499 申请日期 1991.05.17
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