Method for processing the residues of a chlorosilane distillation

摘要

Disclosed is a method for the processing of the residues that occur in the production of chlorosilane. The processing is performed by the separation of the residual chlorosilanes, followed by hydrolysis of these residues with water vapor. The water vapor used has a temperature between 100 DEG and 300 DEG C. and additionally contains hydrogen chloride. The hydrolysis residues occurring in the present method have an extremely small chloride content and can be transported, if desired, directly to a dump. The hydrogen chloride that is released can be absorbed in water and removed as hydrochloric acid or can be desorbed for further technical use. Preferably it is reused for chlorosilane production.