| 摘要 |
An installation for the study of the surface of samples in a vacuum or controlled atmosphere, of the type comprising a main chamber in which is placed a microscopy stage support for at least one device, known as SXM, for microscopy, spectroscopy or engraving a sample surface, according to a process for carrying out the scanning of said surface using an electrically or light conducting microprobe, said installation being characterized in that the stage support can be disconnected from the main chamber and rotated around a central axis in order for an assembly of SXM devices arranged on the periphery of said stage to be used. The invention is applicable, in particular, to electron scanning tunnelling microscopy and/or spectroscopy, especially in ultrahigh vacuums, optic scanning tunnelling microscopy and/or spectroscopy, or to the engraving of nanometric structures using microlithographic optic and/or electronic processes. |
