| 摘要 |
<p>A photosensitive polymer having a logarithmic viscosity number of from 0.1 to 5 dl/g as measured in a solvent at a temperature of 30 +/- 0.01 DEG C at a concentration of 0.5 g/dl; and containing repeating units of the formula: <CHEM> in which R<1> is a trivalent or tetravalent carbocyclic aromatic group or heterocyclic group; R<2> is an aliphatic group having at least two carbon atoms, an alicyclic group, an aromatic aliphatic group, a carbocyclic aromatic group; R<3> is a divalent organic group; R<4> is a hydrogen atom, a monovalent organic group, or a group <CHEM> (in which R<5> is a hydrogen atom or a monovalent organic group, m is 1 or 2, n is 0 or 1, and the sum of m and n is 1 or 2). The invention also provides a process for the preparation of the polymer, composition containing it at the use of said composition in the preparation of patterned masks upon substitutes.</p> |
