发明名称 |
Cryogenic process for the production of methane-free, krypton/xenon product |
摘要 |
The present invention relates to a process for the production of kryton and xenon by using a vapor stream containing greater than 2% oxygen to strip a liquid stream containing oxygen, krypton, methane and xenon of methane. This is accomplished by properly adjusting the liquid to vapor flows in the distillation column. The use of a suitable reflux liquid will decrease the loss of krypton and xenon in the methane laden vapor stream leaving the distillation system.
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申请公布号 |
US5063746(A) |
申请公布日期 |
1991.11.12 |
申请号 |
US19910650523 |
申请日期 |
1991.02.05 |
申请人 |
AIR PRODUCTS AND CHEMICALS, INC. |
发明人 |
AGRAWAL, RAKESH;FARRELL, BRIAN E. |
分类号 |
C01B23/00;F25J3/04 |
主分类号 |
C01B23/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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