发明名称 |
Devices having shallow junctions |
摘要 |
In CMOS based integrated circuits, stricter design rules require source and drain junctions shallower than 2500 ANGSTROM . By using a specific device configuration, a shallow junction is obtainable while resistance to latch-up is improved and other electrical properties, e.g., low leakage current, are maintained. To achieve this result the p-channel device should have an activation energy of the junction reverse leakage current region less than 1.12 eV, with a junction dopant region shallower than 1200 ANGSTROM and a monotonically decreasing junction dopant profile.
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申请公布号 |
US5063422(A) |
申请公布日期 |
1991.11.05 |
申请号 |
US19900515550 |
申请日期 |
1990.04.26 |
申请人 |
AT&T BELL LABORATORIES |
发明人 |
HILLENIUS, STEVEN J.;LEBOWITZ, JOSEPH;LIU, RUICHEN;LYNCH, WILLIAM T. |
分类号 |
H01L21/225;H01L21/8238;H01L27/092;H01L29/08;H01L29/36 |
主分类号 |
H01L21/225 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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