发明名称 NONVOLATILE SEMICONDUCTOR MEMORY
摘要 <p>PURPOSE:To shorten accessing time by operating a first diffused region so provided that an end is superposed under a floating gate at the time of writing and a second diffused region so provided that an end is isolated from the gate as a source, a drain, and operating them as the source, the drain at the time of reading. CONSTITUTION:A memory cell formed of an FAMOS transistor having a floating gate 3 provided on an oxide film 2 covering a semiconductor substrate 1, a first diffused region 5 so provided on the substrate at both sides of the gate 3 that its end is superposed under the gate 3 and a second diffused region 4 so provided that its end is isolated from the gate 3, and a bit line selector for selecting a bit line connected to the region 5 and a bit line connected to the region 4 are provided. The regions 5, 4 are respectively operated as a drain, a source at the time of writing, and the regions 5, 4 are respectively operated as the source, the drain at the time of reading. Thus, accessing time as a whole memory can be shortened.</p>
申请公布号 JPH03242969(A) 申请公布日期 1991.10.29
申请号 JP19900040081 申请日期 1990.02.21
申请人 SHARP CORP 发明人 KUKI MASARU;KITAGUCHI YUKIO
分类号 G11C17/00;G11C16/04;G11C16/06;H01L21/8247;H01L27/115;H01L29/788;H01L29/792 主分类号 G11C17/00
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