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发明名称
CHEMICAL VAPOR DEPOSITION APPARATUS HAVING AN EJECTING HEAD FOR EJECTING A LAMINATED REACTION GAS FLOW
摘要
申请公布号
KR910008793(B1)
申请公布日期
1991.10.21
申请号
KR19870015251
申请日期
1987.12.29
申请人
FUJITSU CO. LTD.
发明人
MIENO FUMITAKE
分类号
C30B25/14;C23C16/44;C23C16/455;C30B29/06;H01L21/205;(IPC1-7):H01L21/205
主分类号
C30B25/14
代理机构
代理人
主权项
地址
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