| 发明名称 |
WERKWIJZE VOOR HET SELECTIEF VERWARMEN VAN EEN FILM OP EEN SUBSTRAAT. |
| 摘要 |
A method for selectively heating a film on a substrate. The film is provided with a different absorption characteristic for light than the absorption characteristic of the substrate. The specimen (combined film and substrate) is illuminated by light having a maximum intensity at a wavelength which will be substantially absorbed by the film and substantially not absorbed by the substrate. |
| 申请公布号 |
NL9100518(A) |
申请公布日期 |
1991.10.16 |
| 申请号 |
NL19910000518 |
申请日期 |
1991.03.22 |
| 申请人 |
PEAK SYSTEMS, INC. TE FREMONT, CALIFORNIE, VER. ST. V. AM. |
发明人 |
|
| 分类号 |
H01L21/00;H01L21/20;H01L21/26;H01L21/268;H01L21/336;H01L29/78;H01L29/786;H01L31/04 |
主分类号 |
H01L21/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
