| 摘要 |
PURPOSE:To enhance light transmittance, heat resistance, and solution stability by forming a resist material with a heat-resistant resin composed of constituents each having a functional group chemically changeable and solubilizable in alkali by heating and constituents each imparting heat resistance to the resin, and a specified photosensitive compound. CONSTITUTION:The resist material comprises the heat-resistant resin composed of the constituents each having the functional group chemically changeable and solubilizable in alkali by heating under an atmosphere containing an acid and the constituent for imparting heat resistance to the resin, and the photosensitive material for generating the acid by exposure to light and represented by formula I in which each of Ro<1> - Ro<3> is H, halogen, straight, branched, or cyclic alkyl, or the like, independent from each other; each of Ro<4> and Ro<5> is as before ore haloalkyl; Xo is a carbon atom, or benzene or naphthalene ring; and (n) is an integer of 0 - 4, thus permitting light transmittance, heat resistance, and solution stability to be enhanced. |
