发明名称 |
METHOD AND DEVICE FOR FORMING MICROOPTICAL ELEMENT |
摘要 |
PURPOSE:To provide the method and device for forming the microoptical element by space selective thin-film formation having the controllability of film shapes and film quality by movably disposing a mask having an aperture of a prescribed size between the spot source spot on a target surface and a substrate for vapor deposition. CONSTITUTION:The target 5 in a vacuum cell 3 is irradiated with the laser beam oscillated from a laser beam source 1 at 45 deg. incident angle via a condensing window part 4 by a condenser element 2. The surface of the target 5 is gradually chipped by the irradiation with the laser beam to change the splashing direction but always the fresh surface of the target 5 is irradiated with the laser beam by the rotation of a mechanism 6 for supporting and rotationally moving the target. The mask 8 having the aperture of the prescribed size is movably provided between the surface to be irradiated with the laser of the target 5 and the vapor deposition surface of the substrate 7 for vapor deposition. The shape of the deposited film on the substrate 7 is controlled by controlling the position of the mask 8. The microlens having desired optical performance is stably formed in this way. |
申请公布号 |
JPH03217803(A) |
申请公布日期 |
1991.09.25 |
申请号 |
JP19900012427 |
申请日期 |
1990.01.24 |
申请人 |
RICOH CO LTD |
发明人 |
HANABUSA MITSUGI;TAKAURA ATSUSHI |
分类号 |
G02B6/13;B29D11/00;C23C14/28;G02B3/00;G02B6/12 |
主分类号 |
G02B6/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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