发明名称 METHOD AND DEVICE FOR FORMING MICROOPTICAL ELEMENT
摘要 PURPOSE:To provide the method and device for forming the microoptical element by space selective thin-film formation having the controllability of film shapes and film quality by movably disposing a mask having an aperture of a prescribed size between the spot source spot on a target surface and a substrate for vapor deposition. CONSTITUTION:The target 5 in a vacuum cell 3 is irradiated with the laser beam oscillated from a laser beam source 1 at 45 deg. incident angle via a condensing window part 4 by a condenser element 2. The surface of the target 5 is gradually chipped by the irradiation with the laser beam to change the splashing direction but always the fresh surface of the target 5 is irradiated with the laser beam by the rotation of a mechanism 6 for supporting and rotationally moving the target. The mask 8 having the aperture of the prescribed size is movably provided between the surface to be irradiated with the laser of the target 5 and the vapor deposition surface of the substrate 7 for vapor deposition. The shape of the deposited film on the substrate 7 is controlled by controlling the position of the mask 8. The microlens having desired optical performance is stably formed in this way.
申请公布号 JPH03217803(A) 申请公布日期 1991.09.25
申请号 JP19900012427 申请日期 1990.01.24
申请人 RICOH CO LTD 发明人 HANABUSA MITSUGI;TAKAURA ATSUSHI
分类号 G02B6/13;B29D11/00;C23C14/28;G02B3/00;G02B6/12 主分类号 G02B6/13
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