发明名称 Radiation sensitive mixture.
摘要 The invention relates to a radiation-sensitive mixture essentially consisting of (a) a water-insoluble binder or binder mixture which is soluble in aqueous alkaline solutions, and (b) a compound which forms a strong acid on irradiation, component (a) being a phenolic resin whose phenolic hydroxyl groups are partially replaced by groups (I) <IMAGE> where R<1> is alkyl and R<2> and R<3> are hydrogen or alkyl or R<1> forms a ring with R<2>. This radiation-sensitive mixture is suitable for producing relief structures.
申请公布号 EP0447868(A1) 申请公布日期 1991.09.25
申请号 EP19910103276 申请日期 1991.03.05
申请人 BASF AKTIENGESELLSCHAFT 发明人 NGUYEN, KIM, SON, DR.
分类号 G03F7/004;G03F7/039;H01L21/027 主分类号 G03F7/004
代理机构 代理人
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