发明名称 DEPOSITION OF CONDUCTIVE METAL BY SOLUTION PROCESS
摘要 AST 5538 DEPOSITION OF CONDUCTIVE METAL BY SOLUTION PROCESS Thin metal films can be formed on a substrate by first coating the substrate with a solution comprising a solubilized metal source (e.g., copper) and a reducing alcohol (e.g., an alkoxyalcohol, an aminoalcohol), drying of the film solution to form a dried film, and heating of the film to reduce the metal to its elemental form.
申请公布号 CA2037808(A1) 申请公布日期 1991.09.24
申请号 CA19912037808 申请日期 1991.03.08
申请人 WHITWELL, GEORGE E., II.;ANTEZZO, MEIYLIN F. 发明人 WHITWELL, GEORGE E., II.;ANTEZZO, MEIYLIN F.
分类号 B05D3/02;C23C20/04;C23C30/00;(IPC1-7):C23C30/00 主分类号 B05D3/02
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