发明名称 |
DEPOSITION OF CONDUCTIVE METAL BY SOLUTION PROCESS |
摘要 |
AST 5538 DEPOSITION OF CONDUCTIVE METAL BY SOLUTION PROCESS Thin metal films can be formed on a substrate by first coating the substrate with a solution comprising a solubilized metal source (e.g., copper) and a reducing alcohol (e.g., an alkoxyalcohol, an aminoalcohol), drying of the film solution to form a dried film, and heating of the film to reduce the metal to its elemental form.
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申请公布号 |
CA2037808(A1) |
申请公布日期 |
1991.09.24 |
申请号 |
CA19912037808 |
申请日期 |
1991.03.08 |
申请人 |
WHITWELL, GEORGE E., II.;ANTEZZO, MEIYLIN F. |
发明人 |
WHITWELL, GEORGE E., II.;ANTEZZO, MEIYLIN F. |
分类号 |
B05D3/02;C23C20/04;C23C30/00;(IPC1-7):C23C30/00 |
主分类号 |
B05D3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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