| 摘要 |
PURPOSE:To enable constant supply of a sufficient developer to a minute part of a pattern and to improve a margin of development by vibrating a wafer, the developer, etc., by ultrasonic waves in the cource of a developing process. CONSTITUTION:A developer 4, a wafer 1, etc., are vibrated in the course of development of the wafer 1 by an ultrasonic vibrator 6 fitted on the outer wall of a liquid bath 3. Thereby the developer 4 is agitated and the nonuniformity in concentration of the developer 4 which occurs as development proceeds is eliminated, while a mechanical pressure wave helps the developer 4 to creep to a minute part of a pattern. Accordingly, faulty development in the minute part of the pattern is prevented and the uniformity in development is improved. In addition, a treating time is shortened by facilitation of a developing reaction and thus a process margin is improved. |
