发明名称 THERMAL HEAD AND PRODUCTION THEREOF
摘要 <p>PURPOSE:To satisfy the requirement of high accuracy and high density and to eliminate a dispersion in resistance value by a method wherein a heating resistor is constructed slightly larger in width dimension than a lead electrode at and around a heat generation part and approximately equal to the lead electrode at the other part. CONSTITUTION:A polysilicon layer 2 is formed on a substrate 1 made of ceramics or the like. Thereon, an electrode layer 3 made of Al or the like is provided. The electrode layer 3 of Al or the like is etched into a pattern form to form lead electrodes 33, 33' and 34, 34'. The polysilicon layer 2 is etched to form heating resistors 21, 22. In the heating element pattern, only the heat generation part and thereabouts is formed with a large width, and the other part is made equal to the lead electrodes 33, 33' and 34, 34' in width. Where the width of the lead electrodes 33, 33' and 34, 34' is l1 and the width of the heat generation part and thereabouts is l2, a relation l2>l1 is held.</p>
申请公布号 JPH03207669(A) 申请公布日期 1991.09.10
申请号 JP19900001979 申请日期 1990.01.09
申请人 TDK CORP 发明人 ITO TOMOKAZU;NAKADA TAKESHI
分类号 B41J2/345;H01C7/00;H01L27/01 主分类号 B41J2/345
代理机构 代理人
主权项
地址