Chamber for vacuum deposition - has one-piece profiles with channels for heating medium and process gas

摘要

The appts. to apply a thin layer to a substrate, using a cathode atomiser in a vacuum chamber, has channels to supply the heating medium and the process gas. They are formed as a component in a one-piece hollow profile. The outlet openings for the gas run across the longitudinal axes of the channels. Pref. the hollow profiles have a rectangular, triangular or polygonal cross section surface, with rounded or circular arc corners. Each hollow profile has a number of axially parallel channels pref. for heating medium feed, heating medium exhaust and the process gas. One or more channels has a rectangular cross section, with an identical cross section for the heating medium feed and return, and the process gas channels have a larger cross section than the heating medium channels. The gas outlet from the gas distribution tube is pref. a drilling leading into the process gas channel, in the centre of the axial extension of the tube and directed vertically downwards. Drillings provide the outlets for the process gas from the channels into the vacuum chamber, at defined intervals across the longitudinal channel axis aligned vertically downwards. The gas flow from the outlet openings is interrupted by sealing/guide plates in the intermediate zone between the inner wall of the chamber and the hollow profiles, and pref. secured to the hollow profiles.