| 摘要 |
PURPOSE:To obtain a fine pattern as well as to faithfully form the pattern of a photomask by rendering an angle of inclination to the edge of a light shielding film when this film is formed on a glass substrate. CONSTITUTION:A light shielding film 11b of chromium, chromium oxide, iron oxide, etc., is formed on a glass substrate 10a by sputtering or vapor deposition and coated with a photoresist film 40 of a high molecular material. The films 10b, 40 are brought into a reaction by irradiation with UV to draw a pattern and the edge of the film 10b is undercut or side-etched by liq. phase etching. The edge of the film 10b is inclined and a photomask 10 is completed. The pattern of the photomask can be faithfully formed and a fine pattern is obtd. |
