| 摘要 |
A process of three dimensional lithography in amorphous polymers to form an instantaneous, permanent image in the polymer by the steps of providing an undoped, non-crystalline layer or film of a polymer having a stable amorphous state under human operating conditions. The film is preferably poly(ethyleneterphthalate) (PET), poly(aryl-ether-ether-ketone) (PEEK), poly(chloro-trifluoroethylene) (Kel-F TM ), poly(carbonate) (ie LEXAN 9032 TM ), poly(sulfone), poly(methylmethacrylate(PMMA, or LUCITE TM ), a poly(cyanurate) such as bisphenol A dicyanate, or an epoxy (eg. Epon 820 TM ). The film can be either self supporting or mounted on a substrate. The film is then covered (and optionally contacted) with a mask which serves to block the radiation from impinging on where no marking is desired. If the mask is in actual contact with the film, it is capable of also acting as a heat sink. Next, the film is exposed through the mask to radiation of sufficient intensity to cause ablation of the exposed areas imparting a distinct, three-dimensional impression in the film. The film may then, for example, be processed by metalization and coating with a protective layer to form a finished product of an optical data storage disk.
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