| 摘要 |
<p>In a method of and an arrangement for preparing an X-ray surface topogram, in which a photographic plate (2) and a smooth surface (4) of a metallic target intended to be shown by an X-ray topogram are placed in the way of propagation of an X radiation beam (R), the smooth surface (4) of the metallic target (1) is irradiated by X radiation by the means of a source characterized by given emission energy, the photographic plate (2) is arranged in close surface contact with the smooth surface (4) of the metallic target, the photographic plate (2) is covered with a layer (3) impervious to light and the irradiating step is carried out with an X radiation beam propagating under angle in the range from about 60° to 90° with respect to the surface of the target, wherein the layer element consists of a material substantially free of elements emitting electrons under the influence of backscattered electrons generated by the X radiation in the smooth surface (4) of the target.</p> |
