发明名称 Wafer processing film for prevention of static electricity failure and contamination.
摘要 <p>A wafer processing film is provided on one side of a base film (1) with a pressure-sensitive adhesive layer (2) and with a release film (3) on the surface of the pressure-sensitive adhesive layer, and coated on the back side of the base film (1) is a phosphoric surfactant (4) wherein ionic components are present in an amount so low as to be undetectable by ion chromatography. The wafer processing film can prevent failure of an integrated circuit by static electricity generated in the handling of the wafer processing film and can also inhibit contamination and corrosion of the wafer by surfactant. <IMAGE></p>
申请公布号 EP0442736(A2) 申请公布日期 1991.08.21
申请号 EP19910301192 申请日期 1991.02.14
申请人 MITSUI TOATSU CHEMICALS, INCORPORATED 发明人 TAKEMURA, YASUO;NARIMATSU, OSAMU;KOMATSU, KAZUYOSHI;TAKEUCHI, YOKO
分类号 C09J7/02 主分类号 C09J7/02
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